High temperature, diamond films and ferroelectric materials are other applications. Sputtering applications are important across a wide range of industries, including the automotive, medical, semiconductors, space, plastics, and military sectors.
New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available.
All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique. Home Handbook of Sputter Deposition Technology. Cuomo,Stephen M. Rossnagel,Harold R. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing.
The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature.
In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise.
He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest.
Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing.
The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. This second edition explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of submicron dimensions.
The book covers PVD, laser and E-beam assisted deposition, MBE, and ion beam methods to bring together all of the physical vapor deposition techniques. The book also includes coverage of chemical mechanical polishing that helps attain the flatness that is required by modern lithography methods and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
This handbook is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and academic researchers in addition to owners of the main Handbook. Some recent developments in the reactive sputtering field are covered, including unbalanced magnetron sputtering and pulsed reactive sputtering.
The articles contain a wealth of practical information relating to applications, practice and manufacturing techniques. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications.
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